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Fath, Peter; Vandewalle, Pieter; Wansleben, Stephan. Advanced inline quality control for crystalline silicon wafer and solar cells. 2005 SOLAR WORLD CONGRESS, 2005, Orlando, Flórida.
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Número de Trabalhos: 1 (Nenhum com arquivo PDF disponível)
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Índice h: Indice h não calculado  
Co-autores: Nenhum co-autor encontrado

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Abstract

In the past three years the worldwide production capacity for solar cells nearly doubled. Only in 2003 eleven new manufacturing lines for mono- and multicrystalline silicon solar cells were set up with a typical throughput of 800 pieces (single printing line) per hour equivalent to product value of about 3600€ to 5200€. In parallel the degree of automation was permanently enhanced in the past years. The most advanced production lines are fully automated (inline factories) or contain mostly only two principle manual handling steps (batch type concept): loading/unloading of the plasma etcher for parasitic edge removal and the transport of wafer stack or cassettes between the individual processing units. This causes less and less interactions of human beings with the product during the manufacturing process. Due to the falling market price for solar cells (ca. 2.8 € per Wp beginning of 2002 to 2€ per Wp mid 2004) as well as the increasing demand of the module manufacturer on the product quality (optical and electrical) increases the pressure on the solar cell manufacturers to optimise their manufacturing line performance (yield, throughput, quality). All the above mentioned aspects necessitate a very efficient quality control (QC) during the whole cell manufacturing process. Due to this aspect significant efforts by solar cell manufacturers, research institutes as well as QC tool manufacturers were undertaken in European research projects (e.g. FAST IQ project) as well as bilateral agreements to develop the needed new inspection systems. Major emphasis was focused on the development of inline quality control systems which can be incorporated in the automated process equipment. New hard- and software tools were realized to trace the wafer lots through their flow within the production process as well as extract and evaluate the obtained data. In a modern QC management system a set of control parameters are defined for each process step by their warning and alarm limits and are checked for each wafer.
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